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Alfa Aesar簡介

Alfa Aesar (阿法埃莎) 是全球首屈一指的科研化學品、金屬和材料的生產商及供應商。半個世紀以來,無數科研人員憑借Alfa Aesar提供的高純度原材料進行了各類研究和開發工作。如今,我們的產品種類已超過46000種,可以提供從克級到噸級的規格。除此之外,我們還可以根據客戶需求定制特殊產品。這些均使得我們成為科研化學品、金屬及材料的一站式供應商。
Alfa擁有廣泛的產品線,包括無機、有機和金屬有機化合物;純金屬和元素;貴金屬化合物和催化劑;燃料電池產品;生化;納米材料;稀土;分析類產品和一流的實驗室器材。依托其母公司強大的全球生產網絡及其它合作伙伴,我們能為客戶提供最高品質的系列產品。Alfa Aesar的產品和服務已遍布醫藥行業、電子行業、學術機構及其他研發領域。
Alfa Aesar堅持以誠信為本、服務至上的理念,產品質量是我們的立身之本,同時Alfa Aesar提供給客戶的遠不止產品本身。現貨庫存、包裝和交付等因素都對滿足和超越客戶期望起著不可或缺的作用。我們既有的質量流程能確保高水平的服務及對服務的不斷提升。我們絕大部分產品有充足庫存,可保證第一時間發貨,加之我們的團隊熱情友好,經驗豐富,使我們的客戶能夠體驗優質卓越的服務。

特色產品

Casno貨號規格質量規格品名
620-45-1A10107100g2,6-Dichloroindophenol sodium salt hydrate 2,6-二氯靛酚鈉鹽水合物
620-45-1A1010725g2,6-Dichloroindophenol sodium salt hydrate 2,6-二氯靛酚鈉鹽水合物
620-45-1A101075g2,6-Dichloroindophenol sodium salt hydrate 2,6-二氯靛酚鈉鹽水合物
429-41-4A10588100ml1M soln. in THFTetra-n-butylammonium fluoride, 1M soln. in THF 四正丁基氟化銨, 1M THF溶液
429-41-4A1058825ml1M soln. in THFTetra-n-butylammonium fluoride, 1M soln. in THF 四正丁基氟化銨, 1M THF溶液
429-41-4A10588500ml1M soln. in THFTetra-n-butylammonium fluoride, 1M soln. in THF 四正丁基氟化銨, 1M THF溶液
919-30-2A10668100g98%(3-Aminopropyl)triethoxysilane, 98% (3-氨丙基)三乙氧基硅烷, 98%
919-30-2A106682.5kg98%(3-Aminopropyl)triethoxysilane, 98% (3-氨丙基)三乙氧基硅烷, 98%
919-30-2A10668500g98%(3-Aminopropyl)triethoxysilane, 98% (3-氨丙基)三乙氧基硅烷, 98%
538-75-0A10973100g99%N,N'-Dicyclohexylcarbodiimide, 99% N,N'-二環己基碳二亞胺, 99%
538-75-0A1097325g99%N,N'-Dicyclohexylcarbodiimide, 99% N,N'-二環己基碳二亞胺, 99%
538-75-0A10973500g99%N,N'-Dicyclohexylcarbodiimide, 99% N,N'-二環己基碳二亞胺, 99%
70955-01-0A115351kgMolecular sieves, 4A, powder 分子篩, 4A, 粉末
70955-01-0A11535250gMolecular sieves, 4A, powder 分子篩, 4A, 粉末
70955-01-0A115355kgMolecular sieves, 4A, powder 分子篩, 4A, 粉末
103-72-0A11596100g97%Phenyl isothiocyanate, 97% 異硫氰酸苯酯, 97%
103-72-0A11596500g97%Phenyl isothiocyanate, 97% 異硫氰酸苯酯, 97%
103-72-0A115965g97%Phenyl isothiocyanate, 97% 異硫氰酸苯酯, 97%
109-89-7A11716100ml99+%Diethylamine, 99+% 二乙胺, 99+%
109-89-7A117162.5L99+%Diethylamine, 99+% 二乙胺, 99+%
109-89-7A11716500ml99+%Diethylamine, 99+% 二乙胺, 99+%
813-19-4A1200710g98%Hexa-n-butylditin, 98% 六正丁基二錫, 98%
813-19-4A12007250g98%Hexa-n-butylditin, 98% 六正丁基二錫, 98%
813-19-4A1200750g98%Hexa-n-butylditin, 98% 六正丁基二錫, 98%
813-19-4A120075g98%Hexa-n-butylditin, 98% 六正丁基二錫, 98%
536-74-3A12139100g98+%Phenylacetylene, 98+% 苯乙炔, 98+%
536-74-3A1213925g98+%Phenylacetylene, 98+% 苯乙炔, 98+%
536-74-3A12139500g98+%Phenylacetylene, 98+% 苯乙炔, 98+%
121-44-8A126462.5L99%Triethylamine, 99% 三乙胺, 99%
121-44-8A12646250ml99%Triethylamine, 99% 三乙胺, 99%
121-44-8A12646500ml99%Triethylamine, 99% 三乙胺, 99%
67-68-5A1328010kg99+%Dimethyl sulfoxide, 99+% 二甲基亞砜, 99+%
67-68-5A132802.5kg99+%Dimethyl sulfoxide, 99+% 二甲基亞砜, 99+%
67-68-5A13280500g99+%Dimethyl sulfoxide, 99+% 二甲基亞砜, 99+%
75-77-4A13651100ml98+%Chlorotrimethylsilane, 98+% 三甲基氯硅烷, 98+%
75-77-4A136511L98+%Chlorotrimethylsilane, 98+% 三甲基氯硅烷, 98+%
75-77-4A1365125ml98+%Chlorotrimethylsilane, 98+% 三甲基氯硅烷, 98+%
75-77-4A13651500ml98+%Chlorotrimethylsilane, 98+% 三甲基氯硅烷, 98+%
75-91-2A13926100ml70% aq. soln.tert-Butyl hydroperoxide, 70% aq. soln. 叔丁基過氧化氫, 70% aq. soln.
75-91-2A139262.5L70% aq. soln.tert-Butyl hydroperoxide, 70% aq. soln. 叔丁基過氧化氫, 70% aq. soln.
75-91-2A13926500ml70% aq. soln.tert-Butyl hydroperoxide, 70% aq. soln. 叔丁基過氧化氫, 70% aq. soln.
865-47-4A13947100g97%Potassium tert-butoxide, 97% 叔丁醇鉀, 97%
865-47-4A139471kg97%Potassium tert-butoxide, 97% 叔丁醇鉀, 97%
865-47-4A13947250g97%Potassium tert-butoxide, 97% 叔丁醇鉀, 97%
865-47-4A1394725g97%Potassium tert-butoxide, 97% 叔丁醇鉀, 97%
865-47-4A13947500g97%Potassium tert-butoxide, 97% 叔丁醇鉀, 97%
501-65-5A13979100g99%Diphenylacetylene, 99% 二苯乙炔, 99%
501-65-5A1397925g99%Diphenylacetylene, 99% 二苯乙炔, 99%
501-65-5A139795g99%Diphenylacetylene, 99% 二苯乙炔, 99%
7803-57-8A140052.5kg98+%Hydrazine monohydrate, 98+% 水合肼一水合物, 98+%
7803-57-8A14005250g98+%Hydrazine monohydrate, 98+% 水合肼一水合物, 98+%
7803-57-8A14005500g98+%Hydrazine monohydrate, 98+% 水合肼一水合物, 98+%
7803-57-8A1400550g98+%Hydrazine monohydrate, 98+% 水合肼一水合物, 98+%
75-03-6A14444100g98+%Iodoethane, 98+%, stab. with copper 碘乙烷, 98+%, 含銅作穩定劑
75-03-6A144442.5kg98+%Iodoethane, 98+%, stab. with copper 碘乙烷, 98+%, 含銅作穩定劑
75-03-6A14444500g98+%Iodoethane, 98+%, stab. with copper 碘乙烷, 98+%, 含銅作穩定劑
287-92-3A14697100ml95%Cyclopentane, 95% 環戊烷, 95%
287-92-3A146972.5L95%Cyclopentane, 95% 環戊烷, 95%
287-92-3A14697500ml95%Cyclopentane, 95% 環戊烷, 95%
109-63-7A15275100ml98+%Boron trifluoride diethyl etherate, 98+% 三氟化硼乙醚,98+%
109-63-7A152751L98+%Boron trifluoride diethyl etherate, 98+% 三氟化硼乙醚,98+%
109-63-7A15275500ml98+%Boron trifluoride diethyl etherate, 98+% 三氟化硼乙醚,98+%
128-08-5A159221kg99%N-Bromosuccinimide, 99% N-溴丁二酰胺, 99%
128-08-5A15922250g99%N-Bromosuccinimide, 99% N-溴丁二酰胺, 99%
128-08-5A159225kg99%N-Bromosuccinimide, 99% N-溴丁二酰胺, 99%
145-50-6A16125100g^a-Naphtholbenzein α-萘酚苯甲醇
145-50-6A1612525g^a-Naphtholbenzein α-萘酚苯甲醇
145-50-6A161255g^a-Naphtholbenzein α-萘酚苯甲醇
7646-85-7A16281100g98+%Zinc chloride, anhydrous, 98+% 無水氯化鋅, 98+%
7646-85-7A1628110kg98+%Zinc chloride, anhydrous, 98+% 無水氯化鋅, 98+%
7646-85-7A162812.5kg98+%Zinc chloride, anhydrous, 98+% 無水氯化鋅, 98+%
7646-85-7A16281500g98+%Zinc chloride, anhydrous, 98+% 無水氯化鋅, 98+%
112-80-1A166631Ltech. 90%Oleic acid, tech. 90% 油酸, tech. 90%
112-80-1A166635Ltech. 90%Oleic acid, tech. 90% 油酸, tech. 90%
7803-49-8B22202100ml50% aq. soln.Hydroxylamine, 50% aq. soln. 羥胺, 50% 水溶液
7803-49-8B22202500ml50% aq. soln.Hydroxylamine, 50% aq. soln. 羥胺, 50% 水溶液
7699-45-8B22510100g98%Zinc bromide, anhydrous, 98% 溴化鋅, 無水, 98%
7699-45-8B22510500g98%Zinc bromide, anhydrous, 98% 溴化鋅, 無水, 98%
2893-78-9B23504100g97%Dichloroisocyanuric acid sodium salt, 97% (dry wt.), water <3% 二氯異氰尿酸鈉, 97%(干燥后質量), 水 <3%
2893-78-9B2350425g97%Dichloroisocyanuric acid sodium salt, 97% (dry wt.), water <3% 二氯異氰尿酸鈉, 97%(干燥后質量), 水 <3%
2893-78-9B23504500g97%Dichloroisocyanuric acid sodium salt, 97% (dry wt.), water <3% 二氯異氰尿酸鈉, 97%(干燥后質量), 水 <3%
10312-55-7B24441100g99%2-Aminoterephthalic acid, 99% 2-氨基對苯二酸, 99%
10312-55-7B2444125g99%2-Aminoterephthalic acid, 99% 2-氨基對苯二酸, 99%
10312-55-7B244415g99%2-Aminoterephthalic acid, 99% 2-氨基對苯二酸, 99%
74-89-5H27664100ml2M in THFMethylamine, 2M in THF 甲胺,2M THF溶液
74-89-5H276641L2M in THFMethylamine, 2M in THF 甲胺,2M THF溶液
124-40-3H27665100ml2M in THFDimethylamine, 2M in THF 二甲胺, 2M THF溶液
124-40-3H276651L2M in THFDimethylamine, 2M in THF 二甲胺, 2M THF溶液
124-41-4L05673100g98%Sodium methoxide, 98% 甲醇鈉, 98%
124-41-4L056732kg98%Sodium methoxide, 98% 甲醇鈉, 98%
124-41-4L05673500g98%Sodium methoxide, 98% 甲醇鈉, 98%
10034-85-2L10410100g57% w/w aq. soln.Hydriodic acid, 57% w/w aq. soln., stab with 1.5% hypophosphorous acid 氫碘酸, 57% w/w 水溶液, 1.5% 次磷酸穩定劑
10034-85-2L10410500g57% w/w aq. soln.Hydriodic acid, 57% w/w aq. soln., stab with 1.5% hypophosphorous acid 氫碘酸, 57% w/w 水溶液, 1.5% 次磷酸穩定劑
112-88-9L110041Ltech. 90%1-Octadecene, tech. 90% 1-十八烯, tech. 90%
112-88-9L11004250mltech. 90%1-Octadecene, tech. 90% 1-十八烯, tech. 90%
7693-26-7L13266100gPotassium hydride, 30% w/w in mineral oil 氫化鉀, 30% w/w 礦物油中
7693-26-7L1326625gPotassium hydride, 30% w/w in mineral oil 氫化鉀, 30% w/w 礦物油中
7446-70-0L18489100g99%Aluminum chloride, anhydrous, powder, 99% 氯化鋁, 無水, 粉末, 99%
7446-70-0L18489500g99%Aluminum chloride, anhydrous, powder, 99% 氯化鋁, 無水, 粉末, 99%
75-24-1042836*4x500ml25% w/w in hexaneTrimethylaluminum, 25% w/w in hexane 三甲基鋁, 25% w/w 正己烷溶液
75-24-1042836100ml25% w/w in hexaneTrimethylaluminum, 25% w/w in hexane 三甲基鋁, 25% w/w 正己烷溶液
75-24-1042836500ml25% w/w in hexaneTrimethylaluminum, 25% w/w in hexane 三甲基鋁, 25% w/w 正己烷溶液
112-88-9L110041000mltech. 90%1-Octadecene, tech. 90% 1-十八烯, tech. 90%
919-30-2A106682500g98%(3-Aminopropyl)triethoxysilane, 98% (3-氨丙基)三乙氧基硅烷, 98%
7440-66-6000424*5x1kg99.9% (metals basis)Zinc powder, -100 mesh, 99.9% (metals basis) 鋅粉, -100 目, 99.9% (metals basis)
7440-66-60004241kg99.9% (metals basis)Zinc powder, -100 mesh, 99.9% (metals basis) 鋅粉, -100 目, 99.9% (metals basis)
7440-66-6000424250g99.9% (metals basis)Zinc powder, -100 mesh, 99.9% (metals basis) 鋅粉, -100 目, 99.9% (metals basis)
7440-66-60004245kg99.9% (metals basis)Zinc powder, -100 mesh, 99.9% (metals basis) 鋅粉, -100 目, 99.9% (metals basis)
7787-70-40116051kg98%Copper(I) bromide, 98% 溴化亞銅(I), 98%
7787-70-4011605250g98%Copper(I) bromide, 98% 溴化亞銅(I), 98%
7681-65-40116061kg98%Copper(I) iodide, 98% 碘化亞銅(I), 98%
7681-65-4011606250g98%Copper(I) iodide, 98% 碘化亞銅(I), 98%
7758-89-6011871100g97%Copper(I) chloride, 97% 氯化亞銅(I), 97%
7758-89-60118712kg97%Copper(I) chloride, 97% 氯化亞銅(I), 97%
7758-89-6011871500g97%Copper(I) chloride, 97% 氯化亞銅(I), 97%
10026-11-6012104100g99.5+% (metals basis)Zirconium(IV) chloride, Reactor Grade, 99.5+% (metals basis) 氯化鋯(IV), 反應級, 99.5+% (metals basis)
10026-11-601210410g99.5+% (metals basis)Zirconium(IV) chloride, Reactor Grade, 99.5+% (metals basis) 氯化鋯(IV), 反應級, 99.5+% (metals basis)
10026-11-60121042kg99.5+% (metals basis)Zirconium(IV) chloride, Reactor Grade, 99.5+% (metals basis) 氯化鋯(IV), 反應級, 99.5+% (metals basis)
10026-11-6012104500g99.5+% (metals basis)Zirconium(IV) chloride, Reactor Grade, 99.5+% (metals basis) 氯化鋯(IV), 反應級, 99.5+% (metals basis)
7705-08-0012357100g98%Iron(III) chloride, anhydrous, 98% 三氯化鐵(III) 無水, 98%
7705-08-001235710g98%Iron(III) chloride, anhydrous, 98% 三氯化鐵(III) 無水, 98%
7705-08-00123571kg98%Iron(III) chloride, anhydrous, 98% 三氯化鐵(III) 無水, 98%
7705-08-001235725kg98%Iron(III) chloride, anhydrous, 98% 三氯化鐵(III) 無水, 98%
7705-08-00123575kg98%Iron(III) chloride, anhydrous, 98% 三氯化鐵(III) 無水, 98%
10101-63-0012724100g99.9985% (metals basis)Lead(II) iodide, 99.9985% (metals basis) 碘化鉛(II), 99.9985% (metals basis)
10101-63-001272425g99.9985% (metals basis)Lead(II) iodide, 99.9985% (metals basis) 碘化鉛(II), 99.9985% (metals basis)
7727-21-10131451kg99.0% minPotassium peroxydisulfate, ACS, 99.0% min 過硫酸鉀, ACS, 99.0% 最低
7727-21-1013145250g99.0% minPotassium peroxydisulfate, ACS, 99.0% min 過硫酸鉀, ACS, 99.0% 最低
7550-35-8013408100g99% minLithium bromide, anhydrous, 99% min 無水溴化鋰, 99%最低
7550-35-80134082500g99% minLithium bromide, anhydrous, 99% min 無水溴化鋰, 99%最低
7550-35-8013408500g99% minLithium bromide, anhydrous, 99% min 無水溴化鋰, 99%最低
2966-50-901393325g98%Silver trifluoroacetate, 98% 三氟乙酸銀,98%
2966-50-90139335g98%Silver trifluoroacetate, 98% 三氟乙酸銀,98%
1313-13-9014340100gMn 58% minManganese(IV) oxide, activated, tech., Mn 58% min 二氧化錳, activated, tech., Mn 58%最低
1313-13-901434010gMn 58% minManganese(IV) oxide, activated, tech., Mn 58% min 二氧化錳, activated, tech., Mn 58%最低
1313-13-9014340500gMn 58% minManganese(IV) oxide, activated, tech., Mn 58% min 二氧化錳, activated, tech., Mn 58%最低
7550-45-0014713*3x1L99.0% minTitanium(IV) chloride, 99.0% min, typically 99.6% 四氯化鈦(IV), 99.0%最低, 通常 99.6%
7550-45-0014713100ml99.0% minTitanium(IV) chloride, 99.0% min, typically 99.6% 四氯化鈦(IV), 99.0%最低, 通常 99.6%
7550-45-00147131L99.0% minTitanium(IV) chloride, 99.0% min, typically 99.6% 四氯化鈦(IV), 99.0%最低, 通常 99.6%
67969-82-8018208250ml50-55% w/w HBF4Tetrafluoroboric acid-diethyl ether complex, 50-55% w/w HBF4 四氟硼酸-乙醚加合物, 50-55% w/w HBF4
67969-82-801820825ml50-55% w/w HBF4Tetrafluoroboric acid-diethyl ether complex, 50-55% w/w HBF4 四氟硼酸-乙醚加合物, 50-55% w/w HBF4
67-68-5022914*4x1L99.9+%Dimethyl sulfoxide, HPLC Grade, 99.9+% 二甲基亞砜, HPLC級, 99.9+%
67-68-50229141L99.9+%Dimethyl sulfoxide, HPLC Grade, 99.9+% 二甲基亞砜, HPLC級, 99.9+%
67-68-50229142500ml99.9+%Dimethyl sulfoxide, HPLC Grade, 99.9+% 二甲基亞砜, HPLC級, 99.9+%
67-68-50229144L99.9+%Dimethyl sulfoxide, HPLC Grade, 99.9+% 二甲基亞砜, HPLC級, 99.9+%
7758-94-3031141250g99.5% (metals basis)Iron(II) chloride, anhydrous, 99.5% (metals basis) 氯化亞鐵(II), 無水, 99.5% (metals basis)
7758-94-303114150g99.5% (metals basis)Iron(II) chloride, anhydrous, 99.5% (metals basis) 氯化亞鐵(II), 無水, 99.5% (metals basis)
7758-94-30311415g99.5% (metals basis)Iron(II) chloride, anhydrous, 99.5% (metals basis) 氯化亞鐵(II), 無水, 99.5% (metals basis)
7789-46-0031154100g98% minIron(II) bromide, anhydrous, 98% min 溴化亞鐵 (II),無水, 98% 最低
7789-46-003115425g98% minIron(II) bromide, anhydrous, 98% min 溴化亞鐵 (II),無水, 98% 最低
7789-46-00311545g98% minIron(II) bromide, anhydrous, 98% min 溴化亞鐵 (II),無水, 98% 最低
7681-52-903336910kg11-15% available chlorineSodium hypochlorite, 11-15% available chlorine 次氯酸鈉, 14.5% 氯
7681-52-90333692kg11-15% available chlorineSodium hypochlorite, 11-15% available chlorine 次氯酸鈉, 14.5% 氯
7681-52-9033369500g11-15% available chlorineSodium hypochlorite, 11-15% available chlorine 次氯酸鈉, 14.5% 氯
77-98-5036560100g35% w/w aq. solnTetraethylammonium hydroxide, 35% w/w aq. soln. 四乙基氫氧化銨, 35% w/w水溶液
77-98-50365602kg35% w/w aq. solnTetraethylammonium hydroxide, 35% w/w aq. soln. 四乙基氫氧化銨, 35% w/w水溶液
77-98-5036560500g35% w/w aq. solnTetraethylammonium hydroxide, 35% w/w aq. soln. 四乙基氫氧化銨, 35% w/w水溶液
872-50-4038986*4x1L99.5%1-Methyl-2-pyrrolidinone, HPLC Grade, 99.5% 1-甲基-2-吡咯烷酮, HPLC級, 99.5%
872-50-40389861L99.5%1-Methyl-2-pyrrolidinone, HPLC Grade, 99.5% 1-甲基-2-吡咯烷酮, HPLC級, 99.5%
872-50-40389864L99.5%1-Methyl-2-pyrrolidinone, HPLC Grade, 99.5% 1-甲基-2-吡咯烷酮, HPLC級, 99.5%
31175-20-9042117100mlNafion|r D-521 dispersion, 5% w/w in water and 1-propanol, |>0.92 meq/g exchange capacity Nafion? D-521分散液, 5% w/w 水和1-丙醇溶液, 交換容量|>0.92 meq/g
31175-20-90421172.5LNafion|r D-521 dispersion, 5% w/w in water and 1-propanol, |>0.92 meq/g exchange capacity Nafion? D-521分散液, 5% w/w 水和1-丙醇溶液, 交換容量|>0.92 meq/g
31175-20-904211725mlNafion|r D-521 dispersion, 5% w/w in water and 1-propanol, |>0.92 meq/g exchange capacity Nafion? D-521分散液, 5% w/w 水和1-丙醇溶液, 交換容量|>0.92 meq/g
31175-20-9042117500mlNafion|r D-521 dispersion, 5% w/w in water and 1-propanol, |>0.92 meq/g exchange capacity Nafion? D-521分散液, 5% w/w 水和1-丙醇溶液, 交換容量|>0.92 meq/g
25114-58-304223010g99.99% (metals basis)Indium(III) acetate, 99.99% (metals basis) 醋酸銦(III), 99.99% (metals basis)
25114-58-304223050g99.99% (metals basis)Indium(III) acetate, 99.99% (metals basis) 醋酸銦(III), 99.99% (metals basis)
1191-15-7042593200ml1M solution in hexaneDiisobutylaluminum hydride, 1M solution in hexane, packaged under Argon in resealable ChemSeal^t bottles 二異丁基氫化鋁, 1M 己烷溶液, 氬氣下可重封的ChemSeal?瓶包裝
1191-15-704259350ml1M solution in hexaneDiisobutylaluminum hydride, 1M solution in hexane, packaged under Argon in resealable ChemSeal^t bottles 二異丁基氫化鋁, 1M 己烷溶液, 氬氣下可重封的ChemSeal?瓶包裝
1191-15-7042593800ml1M solution in hexaneDiisobutylaluminum hydride, 1M solution in hexane, packaged under Argon in resealable ChemSeal^t bottles 二異丁基氫化鋁, 1M 己烷溶液, 氬氣下可重封的ChemSeal?瓶包裝
7681-65-4043153100g99.998% (metals basis)Copper(I) iodide, Puratronic|r, 99.998% (metals basis) 碘化銅(I), Puratronic?, 99.998% (metals basis)
7681-65-404315325g99.998% (metals basis)Copper(I) iodide, Puratronic|r, 99.998% (metals basis) 碘化銅(I), Puratronic?, 99.998% (metals basis)
7681-65-40431535g99.998% (metals basis)Copper(I) iodide, Puratronic|r, 99.998% (metals basis) 碘化銅(I), Puratronic?, 99.998% (metals basis)
68-12-2043997*4x100ml99.80%N,N-Dimethylformamide, anhydrous, 99.8%, packaged under Argon in resealable ChemSeal^t bottles N,N-二甲基甲酰胺, 無水, 99.8%, 氬氣下可重封的ChemSeal?瓶包裝
68-12-2043997*4x1L99.80%N,N-Dimethylformamide, anhydrous, 99.8%, packaged under Argon in resealable ChemSeal^t bottles N,N-二甲基甲酰胺, 無水, 99.8%, 氬氣下可重封的ChemSeal?瓶包裝
68-12-2043997100ml99.80%N,N-Dimethylformamide, anhydrous, 99.8%, packaged under Argon in resealable ChemSeal^t bottles N,N-二甲基甲酰胺, 無水, 99.8%, 氬氣下可重封的ChemSeal?瓶包裝
68-12-20439971L99.80%N,N-Dimethylformamide, anhydrous, 99.8%, packaged under Argon in resealable ChemSeal^t bottles N,N-二甲基甲酰胺, 無水, 99.8%, 氬氣下可重封的ChemSeal?瓶包裝
67-68-5043998*4x100ml99.8+%Dimethyl sulfoxide, anhydrous, 99.8+%, packaged under Argon in resealable ChemSeal^t bottles 二甲基亞砜, 無水, 99.8+%, 氬氣下可重封的ChemSeal?瓶包裝
67-68-5043998*4x1L99.8+%Dimethyl sulfoxide, anhydrous, 99.8+%, packaged under Argon in resealable ChemSeal^t bottles 二甲基亞砜, 無水, 99.8+%, 氬氣下可重封的ChemSeal?瓶包裝
67-68-5043998100ml99.8+%Dimethyl sulfoxide, anhydrous, 99.8+%, packaged under Argon in resealable ChemSeal^t bottles 二甲基亞砜, 無水, 99.8+%, 氬氣下可重封的ChemSeal?瓶包裝
67-68-50439981L99.8+%Dimethyl sulfoxide, anhydrous, 99.8+%, packaged under Argon in resealable ChemSeal^t bottles 二甲基亞砜, 無水, 99.8+%, 氬氣下可重封的ChemSeal?瓶包裝
1898-66-40441501g95%2,2-Diphenyl-1-picrylhydrazyl (free radical), 95% 2,2-聯苯基-1-苦基肼基 (自由基), 95%
1898-66-4044150250mg95%2,2-Diphenyl-1-picrylhydrazyl (free radical), 95% 2,2-聯苯基-1-苦基肼基 (自由基), 95%
1295-35-804415710g96%Bis(1,5-cyclooctadiene)nickel(0), 96% 雙(1,5-環辛二烯)鎳(0), 96%
1295-35-80441572g96%Bis(1,5-cyclooctadiene)nickel(0), 96% 雙(1,5-環辛二烯)鎳(0), 96%
591-51-5045770*5x100mlPhenyllithium, typically 1.9M in di-n-butyl ether 苯基鋰, 通常是1.9M正丁基醚溶液
591-51-5045770100mlPhenyllithium, typically 1.9M in di-n-butyl ether 苯基鋰, 通常是1.9M正丁基醚溶液
591-51-504577025mlPhenyllithium, typically 1.9M in di-n-butyl ether 苯基鋰, 通常是1.9M正丁基醚溶液
2923-28-608872210g98%Silver trifluoromethanesulfonate, 98% 三氟甲烷磺酸銀, 98%
2923-28-60887222g98%Silver trifluoromethanesulfonate, 98% 三氟甲烷磺酸銀, 98%
2923-28-608872250g98%Silver trifluoromethanesulfonate, 98% 三氟甲烷磺酸銀, 98%
70955-01-0A115351000gMolecular sieves, 4A, powder 分子篩, 4A, 粉末
70955-01-0A115355000gMolecular sieves, 4A, powder 分子篩, 4A, 粉末
109-89-7A117162500ml99+%Diethylamine, 99+% 二乙胺, 99+%
121-44-8A126462500ml99%Triethylamine, 99% 三乙胺, 99%
67-68-5A1328010000g99+%Dimethyl sulfoxide, 99+% 二甲基亞砜, 99+%
67-68-5A132802500g99+%Dimethyl sulfoxide, 99+% 二甲基亞砜, 99+%
75-77-4A136511000ml98+%Chlorotrimethylsilane, 98+% 三甲基氯硅烷, 98+%
75-91-2A139262500ml70% aq. soln.tert-Butyl hydroperoxide, 70% aq. soln. 叔丁基過氧化氫, 70% aq. soln.
865-47-4A139471000g97%Potassium tert-butoxide, 97% 叔丁醇鉀, 97%
7803-57-8A140052500g98+%Hydrazine monohydrate, 98+% 水合肼一水合物, 98+%
75-03-6A144442500g98+%Iodoethane, 98+%, stab. with copper 碘乙烷, 98+%, 含銅作穩定劑
287-92-3A146972500ml95%Cyclopentane, 95% 環戊烷, 95%
109-63-7A152751000ml98+%Boron trifluoride diethyl etherate, 98+% 三氟化硼乙醚,98+%
128-08-5A159221000g99%N-Bromosuccinimide, 99% N-溴丁二酰胺, 99%
128-08-5A159225000g99%N-Bromosuccinimide, 99% N-溴丁二酰胺, 99%
7646-85-7A1628110000g98+%Zinc chloride, anhydrous, 98+% 無水氯化鋅, 98+%
7646-85-7A162812500g98+%Zinc chloride, anhydrous, 98+% 無水氯化鋅, 98+%
112-80-1A166631000mltech. 90%Oleic acid, tech. 90% 油酸, tech. 90%
112-80-1A166635000mltech. 90%Oleic acid, tech. 90% 油酸, tech. 90%
74-89-5H276641000ml2M in THFMethylamine, 2M in THF 甲胺,2M THF溶液
124-40-3H276651000ml2M in THFDimethylamine, 2M in THF 二甲胺, 2M THF溶液
124-41-4L056732000g98%Sodium methoxide, 98% 甲醇鈉, 98%
7550-45-0014713bulk L99.0% minTitanium(IV) chloride, 99.0% min, typically 99.6% 四氯化鈦(IV), 99.0%最低, 通常 99.6%
7803-49-8B222021L50% aq. soln.Hydroxylamine, 50% aq. soln. 羥胺, 50% 水溶液

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